Use of photosensitive polyimide for deep x-ray lithography
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White, Victor
Ghodssi, Reza
Herdey, Cheryl
Denton, Denice D.
McCaughan, Leon
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http://dx.doi.org/10.1063/1.113906
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American Inst of Physics, Woodbury, NY, USA
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The following article appeared in White, V., Ghodssi, R., Herdey, C., Denton, D.D., & McCaughan, L. (1995). Use Of Photosensitive Polyimide For Deep X Ray Lithography. Applied Physics Letters, 66(16), 2072-2073. and may be found at http://link.aip.org/link/?apl/66/2072