Modeling template distortion during step-and-flash imprint lithography

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dc.contributor.authorSchuetter, Scott D.
dc.date.accessioned2010-01-16T14:21:57Z
dc.date.available2010-01-16T14:21:57Z
dc.date.issued2005
dc.descriptionxiv, 103 leaves : ill. ; 29 cm.en
dc.identifier.urihttp://digital.library.wisc.edu/1793/38577
dc.language.isoen_USen
dc.titleModeling template distortion during step-and-flash imprint lithographyen
dc.typeThesisen
thesis.degree.disciplineMechanical Engineeringen
thesis.degree.levelMSen

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