High Schottky barrier height of the Al/n-GaAs diodes achieved by sputter deposition

dc.contributor.authorChen, Charlie Chung-Pingen_US
dc.contributor.authorChang, Y. Austinen_US
dc.contributor.authorHuang, Jen-Wuen_US
dc.contributor.authorKuech, Thomas F.en_US
dc.date.accessioned2007-07-13T19:24:36Z
dc.date.available2007-07-13T19:24:36Z
dc.date.issued1994en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent474133 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Chen, C.-P., Chang, Y.A., Huang, J.-W., & Kuech, T.F. (1994). High Schottky Barrier Height Of The Al/N Ga As Diodes Achieved By Sputter Deposition. Applied Physics Letters, 64(11), 1413-15. and may be found at http://link.aip.org/link/?apl/64/1413en_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.111900en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9956
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 1994 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleHigh Schottky barrier height of the Al/n-GaAs diodes achieved by sputter depositionen_US

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