Thin-oxide charging damage to microelectronic test structures in an electron-cyclotron-resonance plasma

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dc.contributor.authorFriedmann, James B.en_US
dc.contributor.authorShohet, J. Leonen_US
dc.contributor.authorMcVittie, James P.en_US
dc.contributor.authorMa, Shawmingen_US
dc.date.accessioned2007-07-13T19:27:55Z
dc.date.available2007-07-13T19:27:55Z
dc.date.issued1995en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent458456 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Friedmann, J.B., Shohet, J.L., McVittie, J.P., & Ma, S.M. (1995). Thin Oxide Charging Damage To Microelectronic Test Structures In An Electron Cyclotron Resonance Plasma. Applied Physics Letters, 67(25), 3718-20. and may be found at http://link.aip.org/link/?apl/67/3718en_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.115360en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10392
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 1995 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleThin-oxide charging damage to microelectronic test structures in an electron-cyclotron-resonance plasmaen_US

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