Electromagnetic fast firing for ultrashallow junction formation

dc.contributor.authorThompson, Keithen_US
dc.contributor.authorBooske, John H.en_US
dc.contributor.authorCooper, Reid F.en_US
dc.contributor.authorGianchandani, Yogesh B.en_US
dc.date.accessioned2007-07-13T19:26:34Z
dc.date.available2007-07-13T19:26:34Z
dc.date.issued2003en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent581633 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThompson, K., Booske, J. H., Cooper, R. F., & Gianchandani, Y. B. (2003). Electromagnetic Fast Firing For Ultrashallow Junction Formation. Ieee Transactions On Semiconductor Manufacturing, 16(3), 460-468.en_US
dc.identifier.doihttp://dx.doi.org/10.1109/TSM.2003.815198en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10216
dc.publisherInstitute of Electrical and Electronics Engineers Incen_US
dc.relation.ispartofhttp://www.ieee.org/en_US
dc.relation.ispartofhttp://ieeexplore.ieee.org/servlet/opac?punumber=66en_US
dc.rightsCopyright 2003 Institute of Electrical and Electronics Engineersen_US
dc.rights©20xx IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.en_US
dc.titleElectromagnetic fast firing for ultrashallow junction formationen_US

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