The use of a supercritical carbon dioxide-based solvent as a cost effective and environmentally sound alternative to current photoresist stripping solvents

Abstract

The semiconductor industry is facing challenges that involve the use of photoresist stripping solvents. This literature review compares the current solvents used, namely sulfuric acid and hydrogen peroxide and N-methylpyrrolidine, to an alternative supercritical carbon dioxide-based solvent. Currently used solvents have proven to be costly in terms of disposal, water usage and treatment, and replacement. These solvents have also been shown to have adverse affects on humans after short term and chronic exposures. The information gathered during this study shows that supercritical carbon dioxide-based solvents can reduce these costs immensely and may be a necessity for staying competitive in the future.