Enhanced surface diffusion through termination conversion during epitaxial SrRuO3 growth

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dc.contributor.authorRijnders, Guusen_US
dc.contributor.authorBlank, Dave H.A.en_US
dc.contributor.authorChoi, Junghoonen_US
dc.contributor.authorEom, Chang-Beomen_US
dc.date.accessioned2007-07-13T19:16:30Z
dc.date.available2007-07-13T19:16:30Z
dc.date.issued2004en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent259529 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Rijnders, G., Blank, D.H.A., Choi, J., & Eom, C.B. (2004). Enhanced Surface Diffusion Through Termination Conversion During Epitaxial Sr Ru O3 Growth. Applied Physics Letters, 84(4), 505-507. and may be found at http://link.aip.org/link/?apl/84/505en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/8884
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleEnhanced surface diffusion through termination conversion during epitaxial SrRuO3 growthen_US

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