Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma
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Cismaru, Cristian
Shohet, J. Leon
Nauka, Krysztof
Friedmann, James B.
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http://dx.doi.org/10.1063/1.120996
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American Institute of Physics
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The following article appeared in Cismaru, C., Shohet, J.L., Nauka, K., & Friedmann, J.B. (1998). Relationship Between The Charging Damage Of Test Structures And The Deposited Charge On Unpatterned Wafers Exposed To An Electron Cyclotron Resonance Plasma. Applied Physics Letters, 72(10), 1143-5. and may be found at http://link.aip.org/link/?apl/72/1143