Measurement of Ion Species Ratio in the Plasma Source Ion-Implantation Process

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dc.contributor.authorTang, Benyangen_US
dc.contributor.authorFetherston, R. Paulen_US
dc.contributor.authorShamim, Mansooraen_US
dc.contributor.authorBreun, Robert A.en_US
dc.contributor.authorChen, Anen_US
dc.contributor.authorConrad, John R.en_US
dc.date.accessioned2007-07-13T19:34:19Z
dc.date.available2007-07-13T19:34:19Z
dc.date.issued1993en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent1027966 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Tang, B.Y., Fetherston, R.P., Shamim, M., Breun, R.A., Chen, A., & Conrad, J.R. (1993). Measurement Of Ion Species Ratio In The Plasma Source Ion Implantation Process. Journal Of Applied Physics, 73(9), 4176-4180. and may be found at http://link.aip.org/link/?jap/73/4176en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/11234
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jap.aip.orgen_US
dc.rightsCopyright 1993 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleMeasurement of Ion Species Ratio in the Plasma Source Ion-Implantation Processen_US

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