Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
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Solak, Harun H.
He, Dongxing
Li, Weimin
Singh-Gasson, Sangeet
Cerrina, Francesco
Sohn, Byeong-Hyeok
Yang, Xiaomin
Nealey, Paul F.
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http://dx.doi.org/10.1063/1.125005
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American Institute of Physics Inc
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The following article appeared in Solak, H.H., He, D., Li, W.S.G.S., Cerrina, F., Sohn, B.H., et al. (1999). Exposure Of 38 Nm Period Grating Patterns With Extreme Ultraviolet Interferometric Lithography. Applied Physics Letters, 75(15), 2328-2330. and may be found at http://link.aip.org/link/?apl/75/2328