Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

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dc.contributor.authorSolak, Harun H.en_US
dc.contributor.authorHe, Dongxingen_US
dc.contributor.authorLi, Weiminen_US
dc.contributor.authorSingh-Gasson, Sangeeten_US
dc.contributor.authorCerrina, Francescoen_US
dc.contributor.authorSohn, Byeong-Hyeoken_US
dc.contributor.authorYang, Xiaominen_US
dc.contributor.authorNealey, Paul F.en_US
dc.date.accessioned2007-07-13T19:18:03Z
dc.date.available2007-07-13T19:18:03Z
dc.date.issued1999en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent204219 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Solak, H.H., He, D., Li, W.S.G.S., Cerrina, F., Sohn, B.H., et al. (1999). Exposure Of 38 Nm Period Grating Patterns With Extreme Ultraviolet Interferometric Lithography. Applied Physics Letters, 75(15), 2328-2330. and may be found at http://link.aip.org/link/?apl/75/2328en_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.125005en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9086
dc.publisherAmerican Institute of Physics Incen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 1999 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleExposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithographyen_US

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