An investigation of the effects of iron in p+n silicon diodes for simulated plasma source ion implantation studies
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Brown, Kelly M.
Shohet, J. Leon
Booske, John H.
Gearhart, Steven S.
Liu, Henley L.
Snodgrass, Thomas G.
Speth, Robert R.
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http://dx.doi.org/10.1109/66.806122
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IEEE
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Brown, K.M., Shohet, J.L., Booske, J.H., Gearhart, S.S., Liu, H.L., Snodgrass, T.G., et al. (1999). An Investigation Of The Effects Of Iron In P+N Silicon Diodes For Simulated Plasma Source Ion Implantation Studies. Ieee Transactions On Semiconductor Manufacturing, 12(4), 452-6.