Low-energy separation by implantation of oxygen structures via plasma source ion implantation

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dc.contributor.authorGoeckner, Matthew J.en_US
dc.contributor.authorTurner, J.E.en_US
dc.contributor.authorDallmann, Douglas Alanen_US
dc.contributor.authorKruger, James B.en_US
dc.contributor.authorShenai, Krishnaen_US
dc.contributor.authorSpeth, Robert R.en_US
dc.contributor.authorBooske, John H.en_US
dc.contributor.authorRissman, Paulen_US
dc.contributor.authorMeyyappan, Naraen_US
dc.contributor.authorLee, S.en_US
dc.contributor.authorPerez-Albuerne, Evelio A.en_US
dc.contributor.authorZhang, L.en_US
dc.contributor.authorShohet, J. Leonen_US
dc.date.accessioned2007-07-13T19:21:39Z
dc.date.available2007-07-13T19:21:39Z
dc.date.issued1994en_US
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent573604 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationThe following article appeared in Zhang, L., Shohet, J.L., Dallmann, D., Booske, J.H., Speth, R.R., Shenai, K., et al. (1994). Low Energy Separation By Implantation Of Oxygen Structures Via Plasma Source Ion Implantation. Applied Physics Letters, 65(8), 962-4. and may be found at http://link.aip.org/link/?apl/65/962en_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.112162en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9566
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.rightsCopyright 1994 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleLow-energy separation by implantation of oxygen structures via plasma source ion implantationen_US

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